Customizable high-precision anti-reflection film (AR film) dedicated electron beam coating machine

• Vacuum system: Molecular pump + Roots pump + mechanical pump combination, vacuum measuring instrument, vacuum chamber.
• Electron gun system: cathode (tantalum wire/tungsten wire), anode, focusing coil, deflection coil, electron beam scanner.
• Membrane material evaporation system: crucible, membrane material feeding mechanism, anti-sputtering shielding cover.
• Workpiece rack and transmission system: Planetary workpiece rack (self-rotation + revolution), heating device (infrared/resistance heating).
• Film thickness monitoring system: quartz crystal oscillation monitor (QCM), optical interference monitor.
• Control system: PLC touch screen, upper computer software, safety interlock device.

Vacuum preparation stage: Close the vacuum chamber door, start the vacuum system to evacuate to the ultimate vacuum (≤5×10⁻⁵ Pa), and at the same time, heat the substrate to the preset temperature (such as 150℃ for glass substrate and 80℃ for resin substrate) through the workpiece rack heating device to remove the water vapor and impurities adsorbed on the substrate surface and enhance the adhesion of the film layer.

Membrane material evaporation stage: The electron gun is activated by PLC. The cathode is heated to generate thermal electrons, which are then accelerated at the anode (acceleration voltage 10-30kV) and focused by the focusing coil to form a high-energy electron beam that bombards the AR membrane material (such as the first layer of SiO₂) inside the crucible. The kinetic energy of the electron beam is converted into thermal energy, causing the membrane material to reach the evaporation temperature (about 1700℃ for SiO₂ and about 2200℃ for TiO₂), and then evaporate into gaseous particles.

Film deposition stage: Gaseous film material particles diffuse towards the substrate in a vacuum environment, adsorb, migrate and condense on the substrate surface, forming a continuous film. The workpiece rack ensures that gaseous particles evenly cover the base surface through self-rotation and revolution, avoiding local thickness deviations.

Final stage of coating: After all the film layers have been deposited, maintain a vacuum environment to cool for 30 to 60 minutes (to avoid internal stress in the film layers due to excessive temperature differences), then slowly release the gas to normal pressure and remove the workpiece. Throughout the entire process, the film thickness monitoring system provides real-time feedback on data and dynamically adjusts the electron beam power and evaporation rate to ensure that the refractive index and thickness of each layer of film meet the AR film design requirements (such as achieving a reflectivity of ≤0.5% in the 400-700nm visible light band).

• The film layer has high precision and meets the core requirements of AR films: film thickness uniformity ≤±2%, and refractive index control accuracy ±0.005. Supports nano-scale film thickness regulation (minimum deposition thickness 0.1nm).
• The membrane material has strong compatibility and covers the mainstream materials of AR films: It can stably evaporate the commonly used membrane materials of AR films and support the alternating deposition of different membrane materials, meeting the design requirements of multi-layer composite AR films.
• High degree of automation, suitable for mass production scenarios: Full-process PLC control, supporting formula storage and rapid switching, production efficiency is increased by more than 30% compared with general coating machines.
• The vacuum environment is clean and the film layer quality is stable: the ultimate vacuum degree is high (≤5×10⁻⁵ Pa), and the residual gas content is low, which can reduce the bubbles and impurities in the film layer. The light transmittance stability of the AR film (in the environment of -40℃ to 85℃) is increased by 20%, and the haze is ≤0.1%.
• It has wide substrate adaptability and meets the needs of multiple scenarios: It supports the preparation of AR films on different substrates such as glass, resin, sapphire, and metal. By adjusting the heating temperature and evaporation rate, strong adhesion between the film layer and the substrate can be achieved.

• It has solved the problem of stable evaporation of high-melting-point AR membrane materials (such as TiO₂ and ZrO₂), and is the preferred preparation equipment for multi-layer broadband AR membranes.
• The precision and stability of the film layer far exceed those of resistance heating coating machines, meeting the AR film requirements of high-end optical products such as camera lenses and laser lenses.
• The mass production efficiency and cost control are superior to those of magnetron sputtering coating machines, making it suitable for large-scale application scenarios such as consumer electronics, photovoltaics, and automobiles.

1. Consumer electronics field (the largest application market)
   Mobile phone/tablet/computer display screen; Camera lens/mobile phone lens; Smartwatch/VR device lenses.
2. Field of optical instruments
   Microscope/telescope lenses; Laser equipment lenses (such as CO₂ laser lenses, fiber laser lenses).
3. Photovoltaic energy field
   Photovoltaic glass; Concentrated Solar System (CSP)
4. Automotive and aerospace fields
   Car windshields/Windows; Aircraft window/aviation mirror.
5. Other special fields
   Medical optical equipment (such as endoscopic lenses, surgical microscopes); Display panels (such as OLED, Mini LED).