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Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
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Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
| Herkunftsort | Guangdong |
| Markenname | Lion King |
| Zertifizierung | CE |
Produktdetails
Anwendung:
Optisch, dekorativ, funktional
Beschichtungsprodukt:
Glas, Metall, Kunststoff, Keramik usw.
Beschichtungsfarbe:
Gold, Silber, Schwarz, Blau, Grün usw.
Zielgröße:
Anpassbar
Zielmaterial:
Ti, Al, Cr, Au, Ag, Cu
Beschichtungstechnologie:
Magnetronsputter
Beschichtungen:
Zinn, Tic, Ticn, Tialn, Crn, Cu, Au, DLC
Beschichtungsfarben:
Schwarz/Blau/Rot/Gold/Roségold/Blau/Silber usw.
Maschinengröße:
Anpassen
Beschichtungsdicke:
0,01–10 Mikrometer
Vakuumsystem:
Hohes Vakuum
Schicht Gleichmäßigkeit:
≤ ± 5%
Beschichtungsprozess:
Magnetronsputter
Stromversorgung:
DC/RF/AC
Substratmaterial:
Glas, Metall, Keramik, Kunststoff
Substratgröße:
Anpassbar
Beschichtungsstruktur:
Einzelschicht, Mehrschicht, Gradient usw.
Kontrollsystem:
SPS, Touchscreen, automatisch
Größe der Beschichtungsausrüstung:
Anpassbar
Beschichtungsmaterial:
Metall, Legierung, Keramik, Verbundmaterial
Beschichtungsmethode:
Magnetronsputter
Hervorheben:
Magnetron sputtering PVD coating machine for mobile phone glass
,PVD coating machine for phone back cover
,Magnetron sputtering vacuum coating machine for Face ID
Zahlungs- und Versandbedingungen
Min Bestellmenge
1
Lieferzeit
45 bis 60 Tage
Produktbeschreibung
Magnetron Sputtering Optical Coating Equipment
It is widely used to coat high-precision optical films on 2D / 2.5D / 3D substrates such as glass, plastic, and metal. It can deposit UV / IR cut-off filters, band-pass filters, RGB filters, LiDAR, AR films, hard AR films, hard films (SiN or DLC), HR films, AS / AF films, dielectric films, transparent conductive films (ITO), metal films (tantalum, titanium, aluminum, chromium, copper), decorative films (CrN, CrON), semiconductors (amorphous silicon, polysilicon), etc.
This series of equipment adopts a combination of metal-mode sputtering technology and high-reactive plasma sources. The load-lock chamber is equipped with a manipulator for automatic substrate transfer. The uniformity in mass production is less than ±1%, ensuring high-quality production. The patented RF-ICP / CCP ion source features a wide working range, balanced energy, high ionization rate, stable operating efficiency, and low energy consumption. It can clean substrates and assist coating to improve film quality.
We offer full optical coating solution. Support you in efficiently creating various high-performance optical films like AR, hard DLC, hydrophobic, AF, AS, ITO, HR, and even multifunctional multi-layer films like DLC+AR+AF
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Kontaktieren Sie uns jederzeit
18207198662
Nr. 3, 17. Etage, Einheit 1, Gebäude 03, Phase II, Jinmao Mansion, Shoukai OCT, Hexie Road, Bezirk Hongshan, Stadt Wuhan, Provinz Hubei, China
