Hubei Lion King Vacuum Technology Co., Ltd.
이메일: sales@lionpvd.com 전화: 86--18207198662
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Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
  • Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
  • Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
  • Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
  • Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
  • Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
  • Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID

Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID

원래 장소 광동
브랜드 이름 Lion King
인증 CE
제품 세부 사항
어플리케이션:
광학, 장식, 기능
코팅 제품:
유리, 금속, 플라스틱, 세라믹 등
코팅 색상:
금,은, 은색, 검은 색, 파란색, 녹색 등
대상 크기:
맞춤형
대상물질:
Ti,Al, Cr, Au,Ag,Cu
코팅 기술:
마그네트론 스퍼터링
코팅:
Tin, Tic, Ticn, Tialn, CRN, CU, AU, DLC
코팅 색상:
블랙/블루/레드/골드//로즈 골드/블루/실버 등.
기계 크기:
사용자 정의
코팅 두께:
0.01-10 미크론
진공 시스템:
높은 진공
코팅 균일 성:
≤ ± 5%
코팅 공정:
마그네트론 스퍼터링
전원공급장치:
DC/RF/AC
기판 재료:
유리, 금속, 세라믹, 플라스틱
기판 크기:
맞춤형
코팅 구조:
단일 레이어, 다층, 그라디언트 등
제어 시스템:
PLC, 터치스크린, 자동
코팅 장비 크기:
맞춤형
코팅 재료:
금속, 합금, 세라믹, 복합 재료
코팅 방법:
마그네트론 스퍼터링
강조하다: 

Magnetron sputtering PVD coating machine for mobile phone glass

,

PVD coating machine for phone back cover

,

Magnetron sputtering vacuum coating machine for Face ID

결제 및 배송 조건
최소 주문 수량
1
배달 시간
45~60 일
제품 설명
Magnetron Sputtering Optical Coating Equipment
It is widely used to coat high-precision optical films on 2D / 2.5D / 3D substrates such as glass, plastic, and metal. It can deposit UV / IR cut-off filters, band-pass filters, RGB filters, LiDAR, AR films, hard AR films, hard films (SiN or DLC), HR films, AS / AF films, dielectric films, transparent conductive films (ITO), metal films (tantalum, titanium, aluminum, chromium, copper), decorative films (CrN, CrON), semiconductors (amorphous silicon, polysilicon), etc.
This series of equipment adopts a combination of metal-mode sputtering technology and high-reactive plasma sources. The load-lock chamber is equipped with a manipulator for automatic substrate transfer. The uniformity in mass production is less than ±1%, ensuring high-quality production. The patented RF-ICP / CCP ion source features a wide working range, balanced energy, high ionization rate, stable operating efficiency, and low energy consumption. It can clean substrates and assist coating to improve film quality.
We offer full optical coating solution. Support you in efficiently creating various high-performance optical films like AR, hard DLC, hydrophobic, AF, AS, ITO, HR, and even multifunctional multi-layer films like DLC+AR+AF
 
Effective Area(mm)
1650x750
2550x1200~1800
2000x1600
2500x1550
Rotational speed
10~100RPM
10~50RPM
Plasma Source
ICP/CCP
DC/ICP/CCP
Evaporation
In-line AF/AS Evaporation Source
Thermal Inline AS/AF
Wavelength
300~1560
300~780
380~780

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18207198662
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