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Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
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Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
| Tempat asal | Guangdong |
| Nama merek | Lion King |
| Sertifikasi | CE |
Detail Produk
Aplikasi:
Optik, dekoratif, fungsional
Produk pelapis:
Kaca, logam, plastik, keramik, dll
Warna pelapis:
Emas, perak, hitam, biru, hijau, dll.
Ukuran target:
Dapat disesuaikan
Bahan Sasaran:
Ti,Al, Cr, Au,Ag,Cu
Teknologi Pelapisan:
Sputtering Magnetron
Pelapis:
Timah, tic, ticn, tialn, crn, cu, au, dlc
Warna lapisan:
Hitam/Biru/Merah/emas//emas mawar/biru/perak dll.
Ukuran Mesin:
Sesuaikan
Ketebalan lapisan:
0,01-10 mikron
Sistem Vakum:
Kekosongan tinggi
Keseragaman pelapis:
≤ ± 5%
Proses pelapisan:
Sputtering Magnetron
Catu Daya:
DC/RF/AC
Bahan Substrat:
Kaca, logam, keramik, plastik
Ukuran Substrat:
Dapat disesuaikan
Struktur pelapis:
Lapisan tunggal, multi-layer, gradien, dll.
Sistem Pengendalian:
PLC, Layar Sentuh, Otomatis
Ukuran peralatan pelapis:
Dapat disesuaikan
Bahan pelapis:
Logam, paduan, keramik, bahan gabungan
Metode pelapisan:
Sputtering Magnetron
Menyoroti:
Magnetron sputtering PVD coating machine for mobile phone glass
,PVD coating machine for phone back cover
,Magnetron sputtering vacuum coating machine for Face ID
Syarat Pembayaran & Pengiriman
Kuantitas min Order
1
Waktu pengiriman
45 ~ 60 hari
Deskripsi produk
Magnetron Sputtering Optical Coating Equipment
It is widely used to coat high-precision optical films on 2D / 2.5D / 3D substrates such as glass, plastic, and metal. It can deposit UV / IR cut-off filters, band-pass filters, RGB filters, LiDAR, AR films, hard AR films, hard films (SiN or DLC), HR films, AS / AF films, dielectric films, transparent conductive films (ITO), metal films (tantalum, titanium, aluminum, chromium, copper), decorative films (CrN, CrON), semiconductors (amorphous silicon, polysilicon), etc.
This series of equipment adopts a combination of metal-mode sputtering technology and high-reactive plasma sources. The load-lock chamber is equipped with a manipulator for automatic substrate transfer. The uniformity in mass production is less than ±1%, ensuring high-quality production. The patented RF-ICP / CCP ion source features a wide working range, balanced energy, high ionization rate, stable operating efficiency, and low energy consumption. It can clean substrates and assist coating to improve film quality.
We offer full optical coating solution. Support you in efficiently creating various high-performance optical films like AR, hard DLC, hydrophobic, AF, AS, ITO, HR, and even multifunctional multi-layer films like DLC+AR+AF
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18207198662
No. 3, Lantai 17, Unit 1, Bangunan 03, Fase II, Jinmao Mansion, Shoukai OCT, Hexie Road, Distrik Hongshan, Kota Wuhan, Provinsi Hubei, Cina
