Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
Magnetron Sputtering PVD Coating Machine For Mobile Phone Front Glass Cover / Back Cover / Face ID
Place of Origin:Zhaoqing, Guangdong
Brand Name:Zhongda
Certification:CE
Minimum Order Quantity:1
Delivery Time:45~60 days
Product Details
Highlight:
Magnetron sputtering PVD coating machine for mobile phone glass
,PVD coating machine for phone back cover
,Magnetron sputtering vacuum coating machine for Face ID
Application:
Optical, Decorative, Functional
Coating Product:
Glass,Metal,Plastic,Ceramic,etc
Coating Color:
Gold, Silver, Black, Blue, Green, Etc.
Target Size:
Customizable
Target Material:
Ti，Al, Cr, Au，Ag，Cu
Coating Technology:
Magnetron Sputtering
Coatings:
TiN, TiC, TiCN, TiAlN, CrN, CU, AU, DLC
Coating Colors:
Black/Blue/Red/gold//rose Gold/blue/silver Etc.
Machine Size:
Customize
Coating Thickness:
0.01-10 Micron
Vacuum System:
High Vacuum
Coating Uniformity:
≤±5%
Coating Process:
Magnetron Sputtering
Power Supply:
DC/RF/AC
Substrate Material:
Glass, Metal, Ceramic, Plastic
Substrate Size:
Customizable
Coating Structure:
Single Layer, Multi-layer, Gradient, Etc.
Control System:
PLC, Touch Screen, Automatic
Coating Equipment Size:
Customizable
Coating Material:
Metal, Alloy, Ceramic, Composite Material
Coating Method:
Magnetron Sputtering
Product Description
Detailed Specifications & Features
Magnetron Sputtering Optical Coating Equipment
It is widely used to coat high-precision optical films on 2D / 2.5D / 3D substrates such as glass, plastic, and metal. It can deposit UV / IR cut-off filters, band-pass filters, RGB filters, LiDAR, AR films, hard AR films, hard films (SiN or DLC), HR films, AS / AF films, dielectric films, transparent conductive films (ITO), metal films (tantalum, titanium, aluminum, chromium, copper), decorative films (CrN, CrON), semiconductors (amorphous silicon, polysilicon), etc.
This series of equipment adopts a combination of metal-mode sputtering technology and high-reactive plasma sources. The load-lock chamber is equipped with a manipulator for automatic substrate transfer. The uniformity in mass production is less than ±1%, ensuring high-quality production. The patented RF-ICP / CCP ion source features a wide working range, balanced energy, high ionization rate, stable operating efficiency, and low energy consumption. It can clean substrates and assist coating to improve film quality.
We offer full optical coating solution. Support you in efficiently creating various high-performance optical films like AR, hard DLC, hydrophobic, AF, AS, ITO, HR, and even multifunctional multi-layer films like DLC+AR+AF
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