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Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications
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Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications
| Place of Origin | Zhaoqing, Guangdong |
| Brand Name | Zhongda |
| Certification | CE |
Product Details
Control System:
Full Auto, Semi Auto, Manual
Coating Process:
Vacuum Evaporation
Rotation Stand:
2 Sets
Server:
Openresty
Dimensions:
Approx. 2000mm X 1500mm X 1800mm
Cooling Method:
Water Cooling
Coating Transparency:
High
Coating Thickness:
Adjustable
Chamber Material:
Stainless Steel Or Carbon Steel
Pumptype:
Rotary Vane Pump + Diffusion Pump
Voltage:
380V, 50Hz Or Custom Made
Coating Technology:
Evaporation
Coating Temperature:
Adjustable
Evaporation Power Supply:
1 Set
Rotation System:
2 Sets
Highlight:
small electron beam evaporation machine
,optical coating PVD equipment
,electron beam coating machine
Payment & Shipping Terms
Minimum Order Quantity
1
Delivery Time
45-60 work days
Product Description
Small Electron Beam Evaporation Coating Machines
Core Technical Specifications
| Parameter Category | Details |
|---|---|
| Substrate Capacity | Max size: Up to 6-inch (150mm); Compatible with 2"/4"/6" wafers/optical components; Min size: 10×10mm |
| Vacuum Performance | Ultimate vacuum: ≤ 1×10⁻⁶ Torr (1.3×10⁻⁴ Pa); Pumping time: minutes to 5×10⁻⁶ Torr; Leak rate: 10⁻³ Pa*L/s (He leak test) |
| Evaporation System | Electron beam power: 250W-10kW; Number of crucibles/pockets: 4-8; Supports rod (max φ4mm) & crucible (1-15cc) feedstock |
| Process Control | Substrate temperature: RT-500℃ (±1℃ precision); Rotation speed: 2-20 rpm; Film thickness monitor: QCM (0.01 nm/s resolution) |
| Film Quality | Uniformity: ±1%-±3%; Adhesion: Meets ASTM D3359 4B standard; Deposition rate: 0.1-10 nm/s |
| Compatibility | Materials: Au, Ag, Pt, W, SiO₂, TiO₂, MgF₂, YF₃, ZrO₂ (supports AR/AF/reflective films) |
| Physical Dimensions | Footprint: 1-3.3×3.0m; Height: 2.5-3.5m; Weight: <800kg (desktop/tabletop models) |
| Power Supply | Single/Three-phase: 220V/380V, 50/60Hz; Power consumption: 1.2kW-10kW |
Key Advantages
Compact & Space-Saving Design
- Desktop/modular structure with Korvus HEX-800 standard, ideal for laboratory/research settings
- Easy integration with glove boxes for inert-atmosphere processes
- Lightweight construction and tool-free module replacement reduce installation & maintenance costs
High-Precision & Reliable Coating
- Electron beam focusing technology enables deposition of refractory metals (Pt, W) and dielectric materials
- 0.01nm/s thickness control with film uniformity ±1% (industry-leading for small-scale equipment)
- Hall ion source + Ar plasma pre-cleaning enhances film adhesion (4B grade) and density
- Meets optical component performance requirements (e.g., AR films with >95% transmittance)
Versatile & Flexible Process Adaptation
- Supports 4-8 crucibles/pockets for multi-material co-evaporation
- Quick switch between metal, oxide, and organic films (AF/AR/reflective/protective coatings)
- Compatible with 2"-6" substrates (wafers, lenses, optical fibers)
- Customizable fixtures (dome/knudzin/plate) for 2D/3D components
Intelligent & User-Friendly Operation
- PLC + touchscreen control system with real-time process monitoring
- Pre-programmed process libraries for quick setup
- Energy-efficient cryopump/magnetic suspension molecular pump design reduces power consumption by 30% vs. traditional systems
Cost-Effective for R&D & Small-Batch Production
- Low initial investment with high target utilization rate (>70%) and minimal material waste
- Suitable for prototyping to small-batch manufacturing (up to 10,000 pieces/year)
- Multi-functional integration (e-beam evaporation + sputtering optional) eliminates need for multiple devices
Core Functions
Precise Heating and Evaporation
- High-energy electron beams bombard target material surfaces, heating to molten or evaporated state
- Concentrated energy and high thermal efficiency enable evaporation of refractory materials (tungsten, molybdenum, titanium, SiO₂, TiO₂)
- Avoids contamination of target material by heating source
- Supports multi-target material switching (2-6 crucible positions) for continuous deposition of single-layer and multi-layer films
Precise Film Thickness Control
- Built-in quartz crystal film thickness monitor for real-time deposition rate and thickness monitoring
- Control accuracy to nanometer level (±0.1nm) for ultra-thin functional films
- Programmable control system with preset deposition parameters (electron beam power, vacuum degree, deposition rate)
- Automated coating ensures batch film layer consistency
High Vacuum Environment Guarantee
- Mechanical pump + molecular pump vacuum unit reduces cavity to 10⁻⁴~10⁻⁶ Pa high vacuum environment
- Reduces gas molecule scattering and contamination of evaporated particles
- Ensures film layers have high purity, good density and strong adhesion
Small-Sized Workpiece Adaptation
- Designed specifically for small workpieces with rotary workpiece table
- Improves coating layer uniformity across substrates
- Suitable for substrates ranging from millimeters to tens of millimeters (wafers, optical lenses, chips, sensor components)
- Supports coating of surface mount, sheet, and small parts
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CONTACT US AT ANY TIME
+8613751829733
Lantang South road, Duanzhou Area, Zhaoqing city, Guangdong 526060 China
