Core components:
RF power supply system, arc target assembly, vacuum system, workpiece bias power supply and control system. The technical complexity is higher than that of DC type.
Working principle:
In a vacuum chamber, the high-frequency electric field excited by the radio frequency power supply ionizes the working gas (such as nitrogen or argon) to form high-density plasma. At the same time, the electric arc acts on the target material, causing it to evaporate. The atoms of the target material are further ionized and activated in the plasma environment, and eventually deposit on the surface of the workpiece under the action of negative bias voltage to form a high-performance film.
যে কোন সময় আমাদের সাথে যোগাযোগ করুন