High Vacuum System Evaporation Vacuum Coating Machine with PLC Control for Multi-layer Coating
High Vacuum System Evaporation Vacuum Coating Machine
,PLC Control Evaporation Vacuum Coating Machine
,Multi-layer Coating Thermal Evaporation Coating Machine
- Central rotation substrate umbrella frame minimizes vibration and particle generation for stable operation
- Electron beam heating method without electrode plates enables stable multi-layer film formation
- Proprietary ratio control method with multi-point online monitoring for high-precision optical films
- Removable substrate umbrella frame with easy lift operation
- Ion source with uniform high ion current density and dual electron guns for 100+ layer plating capability
- Fully automated evaporation process with bell jar or planetary workpiece rack options
- Customizable component configuration to meet specific customer requirements
| Fixture System | Rotating umbrella frames with single or split configuration |
| Heating System | Halogen lamp/armored heater with temperature up to 350℃ |
| Exhaust System | Low vacuum pump set + high vacuum pump set + cryogenic pump/Polycold |
| Vacuum Control | Vacuum controller with Panning and Pirani vacuum gauges |
| Coating System | Electron gun, oxygen-free copper crucible, impedance evaporation source, RF/Kaufman/Hall type ion source |
| Inflation System | MFC or APC automatic pressure controller |
| Film Thickness Control | Crystal controlled or light controlled monitoring |
| Control System | PC + PLC integrated automation |
- Glass substrate transmittance > 91.5%
- 420-680nm band: Single side average transmittance > 95%, reflectance < 0.5%
- Both sides average transmittance > 98%, reflectance < 0.5%
- Increased deposition rates for higher production output
- High-precision processing capabilities for semiconductor, optoelectronics, and photonics applications
- Durable construction with easy maintenance requirements
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