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Annular electron gun electron beam evaporation coating machine customize for customer needs
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Annular electron gun electron beam evaporation coating machine customize for customer needs
| Herkunftsort | Guangdong |
| Markenname | Lion King |
| Zertifizierung | CE |
Produktdetails
Beschichtungssubstrat:
Metall, Glas, Keramik, Kunststoff
Beschichtungsanwendung:
Dekorativ, funktional, schützend
Maschinengröße:
Anpassbar
Rotationsständer:
2 Sätze
Verdampfungsmaterial:
Metall, Legierung, organische Materialien
Kühlsystem:
Wasserkühlung
Beschichtungsmaterial:
Au, Ag, Al, Cu, SiO2 usw.
Beschichtungskammergröße:
Maßgeschneidert
Beschichtungseffizienz:
Hoch
Depositionsquote:
Schnell
Vakuumspiegel:
Hohes Vakuum
Beschichtungsgröße:
Anpassbar
Operation Way:
Touch-Screen
Beschichtungstemperatur:
≤200 ℃
Zeitraum garantieren:
1 Jahr
Betriebsmodus:
Handbuch/automatisch
Beschichtungsabscheidungsrate:
Einstellbar
Hervorheben:
custom electron beam evaporation machine
,annular electron gun coating equipment
,optical electron gun coating system
Zahlungs- und Versandbedingungen
Min Bestellmenge
1
Lieferzeit
45-60 Arbeitstage
Produktbeschreibung
I. Structural Composition
- Annular electron gun system: annular filament (cathode), anode, focusing coil, deflection coil; The annular cathode emits hot electrons, which are accelerated by the electric field and focused and deflector by the magnetic field, precisely bombarding the material inside the crucible.
- Vacuum system: vacuum chamber, mechanical pump, molecular pump/cryogenic pump. The ultimate vacuum usually reaches 10⁻⁴ to 10⁻⁶ Pa, reducing gas-phase collision and contamination.
- Evaporation source and crucible: Water-cooled copper crucible to prevent evaporation and reaction of crucible materials and enhance the purity of the film layer; It supports multi-station switching and multi-layer film deposition.
- Substrate stage: It can be heated/cooled by water, and can rotate around the sun/on its own axis to ensure uniform film thickness.
- Control system: High-voltage power supply, beam control, film thickness monitoring (crystal oscillator), vacuum gauge and automation program, achieving closed-loop control of parameters.
Ii. Working Principle
- Electron beam generation and acceleration: When a toroidal filament is electrified, it emits hot electrons, which are accelerated by a 5-10 kV high-voltage electric field to achieve high energy.
- Focusing and deflection: The electromagnetic coil focuses and deflates the electron beam onto the surface of the target material inside the crucible, with an energy density that can reach 10⁶ to 10⁷ W/cm².
- Evaporation and deposition: The kinetic energy of the electron beam is converted into thermal energy, and the target material rapidly heats up to the evaporation point and vaporizes. Gas-phase atoms/molecules are transported in a straight line to the substrate under high vacuum and condense to form a uniform film.
- Process control: Real-time monitoring of deposition rate and film thickness, dynamic adjustment of beam current and power to ensure process stability.
Iii. Core Features
- High energy density: The local temperature can reach 3000-6000℃, and it can evaporate high-melting-point materials such as tungsten, molybdenum and SiO₂.
- Extremely low pollution: Water-cooled crucibles reduce crucible pollution, and the purity of the film layer can reach over 99.99%.
- Efficiency and rate: High thermal efficiency, deposition rate 0.1-100 nm/s, balancing efficiency and film quality.
- Flexible process: Multi-crucible switching supports multi-layer films. Substrate heating/rotation enhances the compactness and adhesion of the film layer.
Iv. Advantages
- Wide material adaptability: Compatible with metals, alloys, oxides, semiconductors, etc., especially suitable for refractory materials.
- The film layer quality is excellent: high purity, good density and strong adhesion, meeting the requirements of high-precision optical and electronic devices.
- Cost-effectiveness: High material utilization rate, energy consumption concentrated on target materials, and lower long-term operating costs.
- High degree of automation: Parameters are precisely controllable with good repeatability, making it suitable for both scientific research and mass production.
V. Typical Applications
- Optical films: anti-reflection films (AR), high-reflection films, filters, beam splitters, used in glasses, cameras, laser devices, photovoltaic cells.
- Semiconductors and Microelectronics: Metal electrodes (Al, Cu), dielectric layers (SiO₂, Si₃N₄), sensor films.
- Functional coatings: decorative films, conductive films (ITO), corrosion-resistant/wear-resistant coatings, applied in aerospace, tools and consumer electronics.
- Scientific research and small-scale production: Material preparation for universities and research institutes, as well as customized films for MEMS, biomedical devices, etc.
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