| Vacuum Chamber | φ630×H720mm | Heating Method | Top, Side, Bottom (Optional) |
| High Vacuum System | Molecular Pump, Diffusion Pump, Cryogenic Pump (Optional) | Low Vacuum System | Dry Pump, Direct Pump, Roots Pump, Rotary Vane Pump (Optional) |
| Control System | Industrial Computer Touch Screen Fully Automatic Control | Crystal Film Thickness Monitor | Inficon XTC-3, SQC310, Shanghai MXC-3B |
| Ion Source | RF Ion Source, Hall Ion Source, Kaufman Ion Source, Hollow Cathode Ion Source (Optional) | Rotation of Workpiece | Umbrella Workpiece Holder, Roller Workpiece Holder (Optional) |
| Electron Gun | Single, Double, Multi-position (Optional) | Cryogenic Unit | Multiple Suppliers (Optional) |
| Probe System | Single, 6-point and 12-point Rotary Sensor (Optional) | Ultimate Pressure | ≤8.0×10⁻⁵Pa (Clean vacuum chamber at normal temperature) |
| Vapor Barrier System | Unit Block, Two-position Block, Multi-position Rotary Block (Optional) | Vacuum Pressure Maintaining | ≤9×10⁻²Pa after 1 hour with high valve closed |
| Required Power Supply | Three-phase Electricity, 380V, 50HZ | Water Pressure Required | 0.3-0.4Mpa |
| Equipment Weight | 2T-3T | Air Pressure Required | 0.6-0.8Mpa |
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