Quality PVD Magnetron Sputtering Vacuum Coating Machine For Coating Phone back cover metal items factory

PVD Magnetron Sputtering Vacuum Coating Machine For Coating Phone back cover metal items

Place of Origin:Zhaoqing, Guangdong

Brand Name:Zhongda

Certification:CE

Minimum Order Quantity:1

Delivery Time:45~60 days

Tags:

magnetron sputtering coating machine

magnetron sputtering vacuum coating system

magnetron sputtering vacuum coater

Product Details

Highlight:

PVD magnetron sputtering coating machine

vacuum coating machine for metal items

phone back cover coating machine

Application: Optical, Decorative, Functional

Coating Product: Glass,Metal,Plastic,Ceramic,etc

Coating Color: Gold, Silver, Black, Blue, Green, Etc.

Target Size: Customizable

Target Material: Ti，Al, Cr, Au，Ag，Cu

Coating Technology: Magnetron Sputtering

Coatings: TiN, TiC, TiCN, TiAlN, CrN, CU, AU, DLC

Coating Colors: Black/Blue/Red/gold//rose Gold/blue/silver Etc.

Machine Size: Customize

Coating Thickness: 0.01-10 Micron

Vacuum System: High Vacuum

Coating Uniformity: ≤±5%

Coating Process: Magnetron Sputtering

Power Supply: DC/RF/AC

Substrate Material: Glass, Metal, Ceramic, Plastic

Substrate Size: Customizable

Coating Structure: Single Layer, Multi-layer, Gradient, Etc.

Control System: PLC, Touch Screen, Automatic

Coating Equipment Size: Customizable

Coating Material: Metal, Alloy, Ceramic, Composite Material

Coating Method: Magnetron Sputtering

Product Description

Detailed Specifications & Features

Magnetron Sputtering

Technology Overview

Magnetron sputtering is a versatile Physical Vapor Deposition (PVD) technique widely used for depositing high-quality thin films on various substrates. It operates by ionizing a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a uniform, adherent film. This method is particularly suited for metals, alloys, ceramics, and compound materials, offering precise control over film composition and thickness.

Working Principle

Plasma Generation: A high-voltage electric field ionizes argon gas, producing Ar⁺ ions and electrons.
Magnetic Confinement: A magnetic field (orthogonal to the electric field) traps electrons near the target surface, enhancing ionization efficiency and plasma density.
Sputtering Process: Accelerated Ar⁺ ions strike the target, dislodging atoms that travel to the substrate and form a thin film. The magnetic field minimizes electron bombardment of the substrate, reducing heat damage .

Key Advantages

Uniformity & Adhesion: Produces films with exceptional thickness uniformity (±5%) and strong substrate adhesion due to high-energy ion bombardment .
Material Versatility: Compatible with metals (e.g., Ti, Cu), ceramics (e.g., SiO₂, Al₂O₃), and semiconductors.
Low-Temperature Deposition: Suitable for heat-sensitive materials like plastics and polymers.
Process Control: Enables precise tuning of film properties (e.g., conductivity, hardness) via plasma parameters.
Multi-Component Coatings: Supports co-sputtering of multiple targets for alloy or gradient-layer production .

Applied Industries

Electronics: IC packaging, display panels, and photovoltaic cells.
Optics: Anti-reflective coatings, mirrors, and optical filters.
Tooling: Wear-resistant coatings for cutting tools and molds.
Automotive: Decorative and corrosion-resistant finishes on trim and components.
Medical: Biocompatible coatings for implants and instruments .

Coating Effects & Colors

Surface Finishes: Metallic luster, matte textures, or textured patterns.
Color Range: Silver, gold, black, blue, and custom hues via reactive sputtering (e.g., TiN for gold-like finishes).

Structure Types

Planar Magnetron: Ideal for large-area deposition (e.g., glass or panels).
Rotary Magnetron: Enhances target utilization and deposition rate for cylindrical or curved substrates.
Unbalanced Magnetron: Generates plasma with high ion density for dense, adherent films.

Substrate Materials

Plastics (ABS, PET, PC), glass, ceramics, metals, and composites.

Coating Materials

Metals: Ti, Cr, Ag, Al, Cu, Au.
Ceramics: SiO₂, Al₂O₃, TiO₂, Si₃N₄.
Alloys: NiCr, TiAl, and superalloys.

Supporting Production Lines

Integrates with post-coating processes like UV curing or plasma treatment for enhanced functionality.

Consumables

Target materials (metallic/ceramic), argon gas, and sputtering power supplies.

Applications

Optics: High-reflectivity mirrors and anti-glare coatings.
Electronics: Transparent conductive oxides (ITO) for touchscreens.
Aerospace: Thermal barrier coatings on turbine blades.
Architectural Glass: Low-emissivity (low-E) coatings for energy efficiency.

Customization

Our systems offer modular designs with configurable magnetron arrays, vacuum pumping systems, and process control software to meet specific deposition requirements.

Magnetron Coating Equipment Model (Height ≤ 1.3m)
Model	Lion-0710	Lion-1012	Lion-1212	Lion-1412	Lion-1612	Lion-1813
Vacuum chamber	Ф700×H1000mm	Ф1000×H1200mm	Ф1200×H1200mm	Ф1400×H1200mm	Ф1600×H1200mm	Ф1800×H1300mm
Application	watch industry, 3C industry, sanitary appliance industry, jewelry industry
Application	watch accessories, cell phone accessories, glasses frame, clothes, decorative lighting,sanitary ware, hardware suitcase, glass, ceramic and plastic, etc.
Coating Film	Ti-Gold, Rose Gold, Champagne Gold, Japanese Gold, Bright Silver, Rainbow, Jewelry Blue, Rose Red, Black, etc.
Vacuum	Vertical door structure, equip with air pumping system and water cooling system
Vacuum system	Sustaining Pump + Mechanical Pump + Roots Pump + Diffusion Pump or Molecule Pump(specific model according to customers' requirements)
Vacuum	1 set pirani, 1 set cold cathode, 1 set diaphragm gauge
Supply Type	DC power, MF power, pulse power(bias power, arc power)
Ultimate	1.0- 6.0×10-4Pa, Non-loading cooling

Bias Power	20KW/1 set	20KW/1 set	20KW/1 set	30KW/1 set	40KW/1 set	60KW/1 set
Magnetron Power Supply	1-2 set	1-2 set	2-3 set	2-3 set	3-4 set	3-4 set
Rotation	Multi-axis planetary with frequency control(can be controlled and adjusted)
Baking Temperature	Normal temperature～300℃ to 450℃ ～600℃ can be controlled and adjusted(PID temperature control)
Gas	3 or 4 ways working gas flow control and display system matched with auto gas adding system
Gas	Ar, N2, O2, C2H2,etc.
Cooling Method	Water cooling circulation, equip with industrial cooling tower or industrial water chiller(refrigerating machine) ,or cryogenic system.(customers provide)
Controlling	Manual, half-auto, auto, touch screen operation, PLC or computer controlled
Air Pressure	0.5-0.8MPa
Water	≤25℃ ≥0.2MPa
Warning	Alarming system will work when hydropenia, over-voltage, circuit break such abnormal situation happens and carry out related protect
Total Power	25~65KW	45~85KW	65~105KW	85~115KW	95~125KW	100~130KW
Output	Voltage 380V,Frequency 50Hz(equip as customers' national electricity standard)
Occupation	15~50m²	15~50m²	25~55m²	25~55m²	35~55m²	35~55m²
Remark	Design and produce special machine according to customers' require, can add magnetron sputtering target,MF twins target,etc.

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