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Industrial Grade Magnetron Sputtering Vacuum Coating Machine with High Deposition Rate and Superior Film Quality for Broad Material Compatibility
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Industrial Grade Magnetron Sputtering Vacuum Coating Machine with High Deposition Rate and Superior Film Quality for Broad Material Compatibility
| Place of Origin | Guangdong |
| Brand Name | Lion King |
| Certification | CE |
Product Details
Evaporation Power Supply:
1 Set
Coating Thickness:
10–500 Nm
Coating Color:
Customizable
Vacuum Chamber Material:
Carbon Steel Or Stainless Steel
Coating Adhesion:
Strong
Coating Hardness:
High
Coating Transparency:
High
Coating Method:
Magnetron Sputtering
Coating Technology:
Magnetron Sputtering
Voltage:
380V, 50Hz Or Custom Made
Vacuum Level:
High Vacuum
Coating Uniformity:
≤±3%
Power Supply:
DC/RF/AC
Coating Structure:
Single Layer, Multi-layer, Gradient, Etc.
Highlight:
Reaction Sputtering Vacuum Coater
,Industrial Grade Sputtering Vacuum Coater
,Hardware Fittings Sputtering Vacuum Coater
Payment & Shipping Terms
Minimum Order Quantity
1
Delivery Time
45-60 work days
Product Description
Industrial Grade Reaction Magnetron Sputtering Vacuum Coater Machine
Professional PVD vacuum coating system designed for high-end hardware and stainless steel parts with advanced magnetron sputtering technology.
Product Specifications
| Product Type | PVD Vacuum Coating Machine |
| Primary Applications | High-End Hardware and Stainless Steel Parts |
| Construction Material | Stainless Steel |
| Machine Type | Industrial Coating Machine, Metal Coating Machine |
| Weight Range | 5-10 Ton |
| Coating Head Type | Other |
| Coating Width | Customized |
Key Technical Advantages
- High Deposition Rate: Magnetic field increases plasma density for faster sputtering, solving low efficiency issues of traditional diode sputtering
- Superior Film Quality: Produces high-density films with excellent adhesion to substrates and exceptional uniformity
- Broad Material Compatibility: Works with metals, alloys, semiconductors, insulators, and high-melting-point materials
- Precise Process Control: Adjust film thickness, composition, and microstructure by tuning power, gas flow, pressure, and substrate temperature
- Low Contamination: Vacuum environment and physical deposition process minimize chemical impurities in films
System Components & Structure
- Vacuum System: Includes mechanical pump, turbomolecular pump, and vacuum gauge to maintain high vacuum and prevent film contamination
- Target Assembly: Consists of target and magnetic assembly to generate the magnetic field
- Power Supply: Provides energy for plasma generation with common types including DC, RF, and pulsed DC
- Substrate Holder: Fixes and heats/cools substrates with optional rotation function to improve film uniformity
- Gas Control System: Uses mass flow controllers for precise regulation of inert or reactive gas flow rates
- Film Thickness Monitor: In-situ monitors track film thickness in real time to ensure process accuracy
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CONTACT US AT ANY TIME
18924253176
Lantang South road, Duanzhou Area, Zhaoqing city, Guangdong 526060 China
