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RF Magnetron Sputtering Coating Equipment with High Vacuum System Real-time Coating Monitoring and Customizable Target Size for Optical and Decorative Applications
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RF Magnetron Sputtering Coating Equipment with High Vacuum System Real-time Coating Monitoring and Customizable Target Size for Optical and Decorative Applications
| Place of Origin | Guangdong |
| Brand Name | Lion King |
| Certification | CE |
Product Details
Evaporation Power Supply:
1 Set
Vacuum System:
High Vacuum
Application:
Optical, Decorative, Functional
Coating Material:
Metal, Alloy, Ceramic, Etc.
Target Size:
Customizable
Coating Speed:
0.5-1.5 M/min
Coating Monitoring System:
Real-time
Coating Materials:
Metal, Ceramic, Organic Materials
Coating Chamber Size:
Customized
Coating Density:
≥99.9%
Operation Way:
Touch Screen
Coating Hardness:
≥Hv800
Chamber Material:
Stainless Steel
Operation Mode:
Automatic/Manual
Highlight:
RF magnetron sputtering coating machine
,PVD vacuum coating equipment for glasses
,magnetron sputtering machine for metals
Payment & Shipping Terms
Minimum Order Quantity
1
Delivery Time
45-60 work days
Product Description
RF Magnetron Sputtering Coating Equipment
Professional PVD vacuum coating machine designed for coating glasses, metals, and various substrates with precision thin films.
Core Technology Introduction
RF magnetron sputtering coating equipment utilizes magnetron sputtering technology with RF power supply (typically 13.56MHz). The system ionizes inert gases such as argon through radio frequency electric fields to generate plasma. Under magnetic field constraints, the plasma bombards target material surfaces, causing atoms or molecules to escape and deposit uniformly on substrate surfaces, forming high-quality thin films.
Main Features
- Wide material adaptability - capable of sputtering conductors, semiconductors, and insulators without requiring conductive treatment
- Gentle coating process with low substrate temperature - minimizes damage to heat-sensitive substrates including plastics and polymers
- Precise film control - adjustable parameters including power, pressure, and time enable exact control over film thickness, composition, and structure
Core Advantages
- Superior film quality - high density, low defect rates, and strong substrate adhesion
- Stable sputtering rates and high production efficiency - suitable for industrial batch production
- Environmentally friendly process - no chemical reagents required, uses only inert gases, meeting green production standards
Typical Applications
- Electronic Information: Preparation of electrode films and insulating films for semiconductor chips, integrated circuits, and display panels
- Optical Applications: Production of anti-reflection films, reflective films, and filter films for lenses, optical instruments, and photovoltaic modules
- Industrial & Decorative: Wear-resistant, corrosion-resistant, and decorative films for cutting tools, molds, hardware components, and architectural glass
- New Energy: Lithium battery electrode films, fuel cell catalyst layers, and solar cell coatings
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CONTACT US AT ANY TIME
18207198662
Lantang South road, Duanzhou Area, Zhaoqing city, Guangdong 526060 China
