Electron Beam Optical Coating Machine is a core equipment in the field of precision optical manufacturing.It uses high-energy electron beams to melt, evaporate, and ionize high-melting-point optical materials, then deposits the vaporized materials onto the surface of substrates to form ultra-thin, uniform, and high-performance optical films. These films are widely used in optical components like anti-reflection films, high-reflection films, filter films, and polarization films, which are essential for devices in industries such as optics, electronics, aerospace, and semiconductors.
Vacuum Environment Creation
The entire coating process is carried out in a high-vacuum chamber. This environment serves two critical purposes:
Prevents the vaporized material from reacting with air or being scattered by gas molecules, ensuring film purity.
Reduces the collision between vaporized atoms/molecules and gas molecules, allowing the vapor to reach the substrate smoothly and form a dense film.
Electron Beam Generation & Acceleration
An electron gun generates electrons through thermionic emission. The electrons are then accelerated by a high-voltage electric field to obtain high kinetic energy.
Target Material Heating & Evaporation
The high-energy electron beam is focused by a magnetic lens and directed onto the surface of the target material. The kinetic energy of the electrons is converted into thermal energy upon collision with the target, rapidly heating the material to its evaporation temperature (even for materials with melting points above 2000°C, such as alumina . The material then vaporizes into a high-density vapor composed of atoms, molecules, or ions.
Vapor Deposition & Film Formation
The vaporized material particles move in a straight line in the vacuum chamber and are deposited onto the surface of the rotating substrate. As the particles accumulate, they form a thin film with a specific structure and optical properties.
In-Situ Monitoring & Control
During the coating process, a quartz crystal microbalance or optical monitoring system is used to real-time track the film thickness and refractive index. The system feeds back data to the control unit, which adjusts parameters such as electron beam power, substrate temperature, and deposition rate to ensure the film meets design requirements.
High Evaporation Efficiency for High-Melting-Point Materials
Electron beams directly heat the target , enabling evaporation of materials with melting points > 3000°C .
High Film Purity
The vacuum environment and non-contact heating minimize impurities in the film.
Precise Thickness Control
In-situ monitoring systems and adjustable electron beam power allow film thickness control accuracy up to ±0.1 nm, meeting the requirements of multi-layer optical films.
Wide Material Compatibility
Compatible with oxides, fluorides metals, and even ceramics, expanding application ranges.
High Deposition Rate
Deposition rates can reach 1–10 nm/s, improving production efficiency for large-batch optical components.
Optical Communication
Coating of thin films for optical fibers and optical couplers, ensuring low signal loss during light transmission.
Consumer Electronics
Anti-reflection (AR) films for smartphone/laptop screens.Infrared (IR) cut-off filters for camera modules.
Aerospace & Defense
High-reflection films for satellite optical telescopes.Anti-icing and anti-fog optical films for aircraft windshields.
Semiconductor & Optoelectronics
Dielectric films for microchips .Thin-film coatings for light-emitting diodes.
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