Description:
1.Enhance optical, protective and barrier properties by depositing traditional aluminum coatings onto a wide range of flexible substrates. It covers wide widths ranging from 1100 to 3850mm, as well as all common plastic films and paper substrates. It achieves maximum output at different speeds for wide substrates over 2500mm, increasing processing speed by more than 25% compared to traditional systems.
2.It is used for plasma reaction deposition of alumina on flexible materials such as BOPP and PET. The plasma reaction process improves the barrier performance and long-term stability of packaging materials refined with alumina layers to achieve better penetration values. Compared with traditional reactive deposition, the plasma reaction process offers significant improvements and, in combination with the lowest permeability value, enhances the barrier performance and long-term stability of encapsulation materials.
3.In addition to the measurable layer uniformity in substrate width, the innovative evaporator arrangement and gas distribution within the visible range provide significant results, which are of great importance for special optical applications.
Advantages:
1.The robust, durable and easy-to-maintain machine concept can extend the normal operating time
2.The powerful plasma pretreatment technology features high product consistency and better barrier performance
3.Due to the optimized configuration of the aluminum evaporator source, it has unparalleled product quality in terms of layer uniformity
4. Unparalleled product quality in terms of layer uniformity through optimized aluminum evaporator source layout
5.The innovative design and concept of the winding system enable the winding path to flexibly adapt to the requirements of individual substrates and applications
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