| Parameter Category | General Range | Description |
|---|---|---|
| Substrate Width | 300-2000mm | Customizable width according to requirements |
| Substrate Thickness | 10μm-500μm | Adaptable to different flexible substrate thicknesses |
| Coating Material | Metals, alloys, oxides, etc. | Matching corresponding target materials is required |
| Coating Thickness | 5nm-5μm | Adjustable via sputtering power and speed |
| Vacuum Degree | 1×10⁻³ - 5×10⁻⁵ Pa | Ensures sputtering quality and coating purity |
| Production Speed | 0.5-5m/min | Adjusted based on coating thickness and substrate characteristics |
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