| Chamber Structure | High-efficiency horizontal continuous magnetron coating assembly line with front/back roughing pumping chambers, transition chamber, refining pumping chamber, buffer chamber, and color plating chamber |
| Target Design | Advanced rotation cathode target and flat cathode target configurations |
| Power Configuration | High-power medium frequency magnetron sputtering power supply |
| Electrical Control | PLC-controlled production line with industrial computer display system |
| Human-Machine Interface | Interactive control system with alarm reminders and malfunction display for operator guidance |
| Transmission System | Roller transmission with frequency conversion; compatible with glass and flat board substrates |
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