Gold Coating Processes and Configuration for Lion King Vacuum Technology PVD Coating Equipment

Gold Coating Processes and Configuration for Lion King Vacuum Technology PVD Vacuum Coating Equipment

As a leader in PVD (Physical Vapor Deposition) technology, Lion King Vacuum Technology offers two advanced solutions for gold decorative coatings: multi-arc ion plating (MAIP) for gold-like finishes and multi-arc ion plating + magnetron sputtering hybrid systems for pure gold deposition. This article elaborates on their technical differences, pretreatment requirements for various jewelry materials, factory equipment configuration, and color-specific target gas combinations, providing a comprehensive guide for decorative coating applications.

Core Differences Between Gold Coating Processes

The fundamental distinction lies in film formation mechanisms and performance characteristics. MAIP gold coating operates by generating high-current arcs on metal targets (typically titanium or zirconium), which vaporize and ionize target atoms under high vacuum (10⁻³~10⁻⁶Pa) . These ions accelerate toward the substrate via electric fields, forming a dense TiN or ZrN film that mimics gold. This process excels in high deposition rates (3-5μm/h) and strong adhesion (≥40N) due to high ionization rates, but the film surface may have slight macro-particles .

In contrast, the MAIP + magnetron sputtering hybrid system integrates dual advantages: MAIP first deposits a high-adhesion underlayer, while magnetron sputtering forms a uniform pure gold topcoat . The magnetron sputtering component uses argon plasma to sputter pure gold targets, producing a smooth film with Ra μm and precise thickness control (±0.1μm). This hybrid process achieves 99.9% pure gold content, outperforming MAIP’s gold-like alloy films, and is ideal for high-end jewelry requiring authentic gold luster and corrosion resistance.

Pretreatment Specifications for Different Jewelry Materials

Pretreatment directly determines coating adhesion and durability. Water plating (electroplating) is generally unnecessary for Lion King’s PVD processes, as ultrasonic cleaning combined with plasma activation suffices for most materials:

• Copper jewelry: Ultrasonic cleaning with alkaline detergent (50℃, 15min) removes oil and oxides, followed by acid pickling (5% HCl) to eliminate surface tarnish. No water plating is needed—plasma activation (Ar gas, 3min) enhances surface energy for optimal adhesion.
• Aluminum jewelry: Ultrasonic cleaning (neutral detergent, 40℃, 10min) removes grease, while mechanical polishing eliminates natural oxide layers. Plasma etching (Ar/O₂ mixture) further activates the surface; water plating is avoided to prevent adhesion issues.
• Iron jewelry: Rust removal via ultrasonic cleaning (phosphoric acid solution) is critical. A thin electroplated nickel underlayer (5μm) is recommended to prevent corrosion, followed by ultrasonic rinsing and vacuum drying (80℃, 20min).
• Silver jewelry: Ultrasonic cleaning with deionized water (35℃, 8min) removes sulfur compounds. Plasma cleaning (Ar/H₂ mixture) reduces oxidation, eliminating the need for water plating while preserving silver’s inherent properties.

Essential Equipment, Materials, and Gases for Coating Factories

Key Equipment

• Core coating systems: Lion King MAIP machine, MAIP + magnetron sputtering hybrid system
• Pretreatment line: Ultrasonic cleaning tanks (3-5 stages), vacuum drying oven, plasma activation unit
• Supporting systems: Turbomolecular pump (10⁻⁶Pa vacuum), mass flow controllers, DC/RF power supplies, workpiece rotation fixtures
• Quality control tools: Film thickness gauge, adhesion tester, surface roughness meter

Materials

• Targets: Titanium (Ti), chromium (Cr), aluminum (Al), pure gold (Au), titanium-chromium alloy (TiCr), titanium-carbon alloy (TiC)
• Consumables: Ultrasonic cleaning detergents, plasma etching gases, ion source filaments, vacuum sealants
• Substrate preparation materials: Polishing compounds, rust removers, anti-tarnish agents

Gases

• Working gas: Argon (Ar, 99.999% purity) for plasma generation and sputtering
• Reaction gases: Nitrogen (N₂, ≥99.999%) for nitride films, oxygen (O₂) for oxide coatings, acetylene (C₂H₂) for carbon-rich layers
• Auxiliary gas: Hydrogen (H₂, ≤5% of Ar flow) for reducing oxide impurities

Target-Gas Combinations for Conventional Colors

All gas flows are regulated via mass flow controllers to ensure color consistency, with vacuum maintained at 10⁻³~10⁻⁵Pa during deposition . Lion King’s hybrid system enables seamless switching between color recipes, supporting flexible production of customized decorative coatings.