Industrial Grade Reaction Magnetron Sputtering Vacuum Coater Machine for Hardware Fittings

Product Details:

• Product Type PVD Vacuum coating machine
• General Use High-End Hardware and Stainless Steel Parts etc.
• Material Stainless Steel
• Type Industrial Coating Machine, Metal Coating Machine
• Weight (kg) 5-10 Ton Tonne
• Coating Head Other
• Coating Width costomized Centimeter (cm)

Key Advantages 

High Deposition Rate: The magnetic field increases plasma density, leading to faster sputtering—solving the low efficiency problem of traditional "diode sputtering."

Superior Film Quality: Films have high density, good adhesion to substrates, and excellent uniformity.

Broad Material Compatibility: Works with almost all materials, including metals, alloys, semiconductors, insulators , and even high-melting-point materials.

Precise Process Control: Film thickness, composition, and microstructure can be adjusted by tuning parameters like power, gas flow, pressure, and substrate temperature.

Low Contamination: The vacuum environment and physical deposition process minimize chemical impurities in the film—critical for semiconductor and optical applications.

Structure Types

vacuum System:Includes a mechanical pump, turbomolecular pump, and vacuum gauge. Maintains high vacuum to prevent film contamination. 

Target Assembly:Consists of the target and a magnetic assembly to generate the magnetic field.

Power Supply:Provides energy for plasma generation.

Common types: DC, RF, and pulsed DC.

Substrate Holder:Fixes and heats/cools the substrate. May include a rotation function to improve film uniformity.

Gas Control System:Uses mass flow controllers to precisely regulate the flow rate of inert gases or reactive gases.

Film Thickness Monitor:In-situ monitors track film thickness in real time to ensure process accuracy.