Equipment Introduction
Resistance evaporation coating equipment is a core type of physical vapor deposition (PVD) equipment, mainly composed of a vacuum chamber, resistance evaporation source, vacuum system, substrate rack, temperature control system, etc.
Working principle
When in operation, first evacuate the vacuum chamber to the set vacuum degree, then heat the resistance heating element through an electric current, causing the evaporation material (metal, alloy, compound, etc.) placed on the heating element to melt and vaporize. The gaseous atoms or molecules move in a straight line and deposit on the surface of the substrate to be coated, ultimately forming a uniform film.
Core features
The structure is simple and easy to operate, with few core components and low maintenance costs.
It features high heating efficiency, fast temperature rise, and can quickly vaporize the material, resulting in a relatively short coating cycle.
The equipment purchase price is lower than that of electron beam evaporation, magnetron sputtering and other equipment, and the operating energy consumption is relatively low.
Main applications
In the field of optics: Preparing anti-reflection films and reflective films for optical lenses, such as single or multi-layer optical films for spectacle lenses and camera lenses.
In the field of electronics: Manufacturing electrode films and conductive films for semiconductor devices and electronic components, such as metal films for integrated circuit leads and capacitor electrodes.
Decoration field: Coating decorative films for plastic products, hardware parts, jewelry, etc., such as gold and silver coatings for mobile phone casings and accessories.
Other fields: Research on aluminum film coating on the surface of packaging materials (such as aluminum foil for food packaging), preparation of functional films on the surface of sensors, and film preparation for laboratory samples.
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