| Vacuum System | Ultimate vacuum ≤ 5×10⁻⁴ Pa |
| Evaporation Source Type | Resistance heating (multiple tungsten boats) + optional electron beam heating |
| Coating Rate | Resistance evaporation: 50-200 nm/min; Electron beam evaporation: 30-150 nm/min |
| Maximum Workpiece Size | Maximum diameter ≤ 1200 mm (customizable) |
| Film Thickness Uniformity | ±3%-5% for flat substrates; ±8%-10% for complex curved surfaces (optimized via workpiece rotation) |
| Control Method | PLC automatic control, supporting recipe storage and remote monitoring |
| Environmental Performance | No wastewater or exhaust emissions, compliant with RoHS and REACH standards |
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