Arc Ion + Magnetron Sputtering Hybrid PVD Coating Machine: A Complete Buyer's Guide

In the wave of industrial manufacturing upgrading towards high precision and high reliability, surface treatment technology has become a core link in enhancing product competitiveness. The arc ion + magnetron sputtering hybrid PVD coating machine integrates the advantages of the two mainstream physical vapor deposition technologies. It not only possesses the high-speed deposition characteristics of arc ion plating but also has the film density advantage of magnetron sputtering. It is widely used in multiple fields such as electronics, machinery, automobiles, and optics.

• The core feature is to generate high-density metal plasma through high-voltage arc, which enables the film layer to form a metallurgical bond with the substrate, and the adhesion far exceeds that of ordinary coating technology.
• It focuses on functional coatings, especially suitable for hard coatings such as TiN, TiCN, TiAlN, and CrN, which can significantly enhance the wear resistance and corrosion resistance of products.
• The drawback is that there may be tiny particles on the surface of the film layer, which makes its decorative effect slightly weaker and the color options relatively limited.

• The core advantage lies in using a magnetic field to confine electrons, achieving uniform deposition of target material atoms and forming a smooth and fine film.
• Focusing on decorative and special functional coatings, it can precisely present a variety of colors such as stainless steel, black, rose gold, and rainbow colors, and can also prepare special functional films such as DLC (diamond-like carbon).
• The drawback is that the adhesion of the pure sputtering film layer is relatively weak, and it is difficult to withstand complex working conditions when used alone.

• Addressing a single technical pain point: AIP compensates for the insufficient adhesion of MS, while MS improves the surface roughness and uneven color defects of AIP.
• Achieve performance superposition: After combination, it not only retains the strong bonding force brought by AIP, but also has the smooth surface and stable color of MS, and is compatible with more substrates and coating types.
• Enhance production value: The two processes are completed in the same vacuum chamber without secondary treatment, significantly improving production efficiency and meeting the demands of mass production.

Semiconductor chips can enhance their performance and reliability by depositing metal electrodes (such as tungsten and copper) and insulating layers (such as silicon nitride) through equipment. Functional films such as transparent conductive films (ITO) and electron transport layers for OLED and QLED display panels can also be prepared by this equipment. After coating treatment, the moisture-proof, anti-oxidation and electromagnetic shielding performance of electronic components such as resistors and capacitors and their packaging shells are significantly enhanced. In addition, special electronic components such as bipolar plates for hydrogen energy fuel cells, DPC ceramic substrates, and PCB flexible printed circuit boards have also become key application targets for hybrid PVD machines.

The service life of cutting tools, stamping dies, injection molds and other tools and dies can be significantly extended by depositing hard coatings such as TiN and TiAlN. After the core components of a car engine, such as piston rings, valves and crankshafts, are coated, their wear resistance and friction reduction performance are enhanced, and the reliability of the engine is significantly improved. The appearance and functional components of automobiles such as lamps, rearview mirrors and windshields can also achieve anti-fog, anti-glare and heat insulation effects through coating.

Optical components such as camera lenses and telescope lenses can deposit anti-reflection films and high-reflectivity films to reduce light reflection and increase light transmittance. Optical devices such as wavelength division multiplexers and optical isolators achieve precise modulation of light by precisely controlling the thickness of the film layer. After thermal barrier coating treatment, the thermal efficiency and service life of components such as aero-engine blades and combustion chambers have been significantly improved. The structural components and optical Windows of spacecraft are coated to achieve functions such as radiation protection and heat insulation, ensuring normal operation in the harsh space environment.

Medical implants such as artificial joints, pacemakers, and vascular stents can deposit biocompatible coatings like diamond-like carbon and hydroxyapatite to reduce rejection reactions in the human body. The sensitive films and protective films of biosensors such as glucose sensors and DNA sensors have significantly improved sensitivity and stability after coating treatment.

When pure metal target materials are used for deposition, various metallic colors can be obtained. A bright silver coating can be obtained by using aluminum targets, which are suitable for decorative components. Copper targets can produce a warm copper color and are often used in electronic components and decorative parts. Titanium targets can form a light gray coating, which combines texture and corrosion resistance. Gold targets and silver targets respectively produce golden yellow and bright silver, and are mostly used in high-end decoration and electronic conductive fields.

Through the chemical reaction between metal target materials and reactive gases (such as nitrogen and oxygen), rich compound colors can be formed. The TiN coating presents a golden yellow color and is a commonly used color for tools, molds and decorative parts. The CrN coating is silver-gray and features both high hardness and wear resistance. The TiAlN coating appears purple-black and has excellent high-temperature resistance, making it suitable for tools and molds in high-temperature working conditions. The ZrN coating is light golden yellow, featuring both decorative effect and wear resistance.

Personalized color customization can be achieved through multi-layer film structure design or target material combination. For instance, a blue-purple coating can be obtained through the combined deposition of TiAlN and SiN. Adjusting the target material ratio of Ti to Al can achieve a gradient color from golden yellow to rose gold. Some devices support the precise regulation of film layer composition and thickness through AI-driven deposition models, enabling customized production of specific color values and meeting the color requirements of high-end products.

As the basic environmental guarantee for coating, it is mainly composed of a vacuum chamber, a vacuum pump set and a vacuum measurement device. Vacuum chambers mostly adopt octahedral design, supporting front and rear doors and modular installation, which is convenient for component interchangeability and maintenance. The common size is φ950×1350mm, and the plasma uniform zone can reach φ650×H750mm. Vacuum pump sets typically adopt a combination configuration of turbomolecular pumps, Roots pumps, and rotary vane pumps to ensure that the cavity quickly reaches a high vacuum state. Among them, the pumping speed of the turbomolecular pumps is mostly 2×2000L/S, meeting the requirements of high-precision coating.

It is the core component for achieving hybrid coating, including an arc ion source, a magnetron sputtering source and an ion source. Arc ion sources are typically equipped with 8 sets of arc cathodes, each with a power of 5KW, which can rapidly ionize target materials to form plasma. Magnetron sputtering sources mostly adopt medium-frequency sputtering cathodes, with a power of up to 36KW, supporting multi-target co-sputtering and composition gradient control. The power of the linear ion source is approximately 5KW, which is used for plasma etching and enhancing the adhesion of the film layer, effectively reducing the defect density.

It adopts a two-level control architecture of computer and PLC to achieve precise regulation of process parameters and automated operation. It can monitor key parameters such as vacuum degree, deposition temperature and gas flow rate in real time. Among them, the gas control system is equipped with 5 MFC (Mass Flow Controller) channels to ensure the precise supply of reaction gas. Some high-end equipment integrates Industrial 4.0 interfaces, supporting remote parameter optimization and process data traceability, thereby enhancing production stability.

The workpiece rack mostly adopts a cylindrical planetary structure. The workpiece rotates both on its own axis and around the center, ensuring the uniformity of the film layer. The common configuration is six φ300mm workstations. The heating system has a power of up to 18KW, with the maximum temperature controlled at 500℃. Precise temperature regulation is achieved through thermocouple PID control to meet the coating temperature requirements of different substrates.

It includes a water-cooled pipeline system, a circulating refrigeration constant temperature water tank and a detection and alarm system. The water cooling system cools the deposition source and the cavity to prevent damage to the components caused by high temperatures. The detection and alarm system monitors the operation status of the equipment in real time, promptly alerts for abnormal vacuum, power failure and other situations, and ensures production safety.

Mass production enterprises should give priority to choosing cluster-type structure equipment, with a single-chamber production capacity of ≥30 pieces per hour, supporting multi-target confocal layout to meet the demands of batch production. Research and development-oriented enterprises can choose single-chamber equipment, emphasizing modular design and flexible configuration, which is convenient for replacing target materials and adjusting processes, and is suitable for the research and development of new materials and new coatings. At the same time, the cavity specification should be selected based on the size of the base material to ensure that the workpiece can be fully within the plasma uniform zone and guarantee the uniformity of the film layer.

Select the deposition source configuration based on the type of target film layer. When preparing hard coatings, it is necessary to enhance the compatibility of the arc ion source power with the target material, and support target materials such as Ti, Al, and Cr. To prepare optical films or transparent conductive films, it is necessary to optimize the magnetron sputtering source and equip it with a medium frequency or radio frequency power supply. If the reactive sputtering process is required, it is necessary to confirm the number of gas channels and the MFC accuracy of the equipment to ensure that the proportion of reactive gas can be precisely controlled. For users with special requirements, it is necessary to pay attention to whether the equipment supports PECVD process expansion to achieve the deposition of carbon-based non-conductive film layers.

In terms of coating quality, attention should be paid to the uniformity of the film layer (the thickness deviation of the entire wafer is ≤±1.5%), hardness (HV3500 and above are preferred), and adhesion. In terms of production efficiency, the key points to be examined are the deposition rate (preferably equipment capable of reaching 5 microns per minute) and the vacuum pumping time. In terms of equipment stability, priority should be given to choosing equipment with a high domestic production rate of core components (such as over 85%) and low energy consumption to reduce the cost of later maintenance. In terms of the degree of automation, select the corresponding control system based on the production scale. For batch production, it is recommended to choose equipment with intelligent target material management and remote monitoring functions.

The cost of equipment procurement should be reasonably planned in combination with the demand for production capacity to avoid excessive configuration leading to cost waste. The later maintenance cost should focus on the utilization rate of target materials, energy consumption levels and the lifespan of vulnerable parts. At the same time, it is necessary to examine the technical support capabilities of the suppliers, including process debugging, personnel training and after-sales response speed. Suppliers that can provide customized solutions and long-term technical services should be given priority. For second-hand equipment, it is necessary to verify the lifespan of the target material, the status of the vacuum pump set, and the calibration of the MFC, and to verify the uniformity and adhesion through measured sample pieces.

Choosing the right arc ion + magnetron sputtering hybrid PVD coating machine is a key investment to enhance the competitiveness of products. It is recommended to clarify one's own production requirements and process goals before making a decision, and conduct a comprehensive assessment through on-site inspection of equipment operation status, testing of sample performance and other methods.